O’Melveny Advises Inpria in Latest Funding Round

March 02, 2016

SILICON VALLEY, CA -- MARCH 2, 2016 -- O’Melveny represented Inpria Corporation, a pioneer in high-resolution photoresists, in its latest financing. The round was led by investor Air Liquide Venture Capital with participation from existing investors Samsung Venture Investment Corporation and Intel Capital along with new investor Tokyo Ohka Kogyo. 

Inpria was represented by O’Melveny partner Paul Sieben, counsel Tim Hagen, and associate Snehal Desai. 

About O’Melveny & Myers LLP
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Contact:
Emily Lattal
O’Melveny
212.326.2285
elattal@omm.com 

The following release was issued by Inpria:

Inpria Announces New Funding from Air Liquide, Samsung, Intel Capital and TOK, and Broadens Industry Support
Financing to be used to complete EUV photoresist development and commence scale-up manufacturing

March 1, 2016

CORVALLIS, Ore.--(BUSINESS WIRE)--Inpria Corporation, a pioneer in high-resolution photoresists, announced today the successful closing of its most recent financing, thereby doubling the company’s total financing to date. This round was led by new investor Air Liquide Venture Capital (ALIAD) with significant participation from existing investors Samsung Venture Investment Corporation and Intel Capital. New investor Tokyo Ohka Kogyo (TOK) also joined the round.

Inpria will use the proceeds to complete product development and to scale-up manufacturing for its metal oxide photoresists. With a focus on extreme ultraviolet (EUV) lithography, Inpria photoresists offer semiconductor manufacturers a purpose-built solution for semiconductor patterning at 7nm and beyond. Inpria’s products are designed not only to support critical imaging requirements but also to uniquely simplify the pattern transfer process. “We are thrilled to have ALIAD and TOK join as our newest investors,” said Andrew Grenville, CEO of Inpria Corporation. “Their participation, along with continued support from both Samsung and Intel Capital, reflects Inpria’s progress and the industry’s increasing interest in novel patterning solutions.”

“We are delighted to take a minority stake in Inpria, an innovative technology start-up developing a new platform of inorganic patterning materials for the semiconductor industry,” said Pierre-Etienne Franc, VP Advanced Business & Technologies of Air Liquide and CEO of ALIAD.

The financing highlights expanding industry support for novel EUV resist development to improve imaging capability. “With semiconductor materials, development relationships and industry support are critical components of a successful product development process,” commented Wendell Brooks, president of Intel Capital. “Over the past two years, Inpria has demonstrated capability in both materials technology development and commercialization.”

Grenville concluded by saying, “Last year we dramatically improved the sensitivity of our photoresists and worked diligently with our partners to address key integration and performance needs. Looking ahead, we believe 2016 will be a pivotal year for our products.”


About Inpria
Inpria Corporation is a pioneer in extending semiconductor manufacturing with inorganic thin-films for nanoscale patterning. Inpria’s metal oxide photoresists for EUV lithography enable advanced performance with simplified processing. (www.inpria.com)

About Air Liquide Venture Capital (ALIAD)
www.airliquide.com/connected-innovation/aliad-venture-capital 

About Intel Capital 
www.intelcapital.com or follow @Intelcapital 

About Samsung Ventures Investment Corporation
www.samsungventures.com

About Tokyo Ohka Kogyo Co., Ltd. (TOK)
www.tok.co.jp

Contacts
Inpria Corporation
Ann Carney Nelson, 541-844-2812
acn@inpria.com